Advances in Research and Development, Volume 23: Modeling...

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Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films)

Name: Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films)
ISBN: 9780125330237

Maurice H. Francombe, John L. Vossen

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Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

Κατηγορίες:

Engineering

Έτος:

1997

Εκδότης:

Academic Press

Γλώσσα:

english

Σελίδες:

311

ISBN 10:

0125330235